師資人員	首頁師資人員專任教師

陳志臣 教授兼副校長　Chen, Jyh-Chen 辦公室： (Office) E4-362 專線電話： (Tel) 03-4267321 校內分機： (Campus Extension) 34321 傳真電話: (Fax) 03-4254501 E-mail： jcchen@cc.ncu.edu.tw

論文著作 (Publications) 【下載完整著作目錄】

題目 作者姓名 期刊名稱 出版 年份 期別及 起訖頁數 期別種類 Numerical simulation of the effect of heater position on the oxygen concentration in the CZ silicon crystal growth process Ying-Yang Teng, Jyh-Chen Chen, Chung-Wei Lu, Cheng-Chuan Huang, Wan-Ting Wun, Hsueh-I Chen, Chi-Yung Chen, Wen-Chieh Lan Journal of Photoenergy 2012 Article ID 395235.(doi:10.1155/2012/395235) Numerical investigation of the effect of heat shield shape on the oxygen impurity distribution at the crystal-melt interface during the Czochralski silicon crystal growth Ying-Yang Teng, Jyh-Chen Chen, Cheng-Chuan Huang, Chung-Wei Lu, Wan-Ting Wun, Chi-Yung Chen Journal of Crystal Growth 2012 Vol. 352, pp. 167-172.(doi:10.1016/j.jcrysgro.2011.12.070) Numerical investigation of oxygen impurity distribution during multicrystalline silicon crystal growth under a gas flow guidance device Ying-Yang Teng, Jyh-Chen Chen, Chung-Wei Lu, Chi-Yung Chen Journal of Crystal Growth 2012 Vol. 360, pp. 12-17 High power LED package with vertical structure M.-T. Lin, S.-P. Y, M.-Y. Lin, K.-Y. Tai and J.-C. Chen Microelectronics Reliability 2012 Vol. 52, pp. 878-883. (doi:10.1016/j.microrel.2011.07.064) Effect of slippage on the thermocapillary migration of a small droplet H.-B. Nguyen and J.-C. Chen Biomicrofluidic 2012 Vol. 6, 012809. (http://dx.doi.org/10.1063/1.3644382) Two-dimensional displacement measurement by quasi-common-optical-path heterodyne grating interferometer H.-L. Hsieh, J.-C. Chen, G. Lerondel, and J-Y Lee Optics Express 2011 Vol. 19, Issue 10, pp. 9770-9782. doi:10.1364/OE.19.009770 A Heterodyne Grating Interferometer Based on a Quasi Common Optical Path Configuration for Two-DOF Straightness Measurement J-Y Lee, H.-L. Hsieh, G. Lerondel, R. Deturche, M.-P. Lu, and J.-C. Chen Applied Optics 2011 Vol. 50, pp. 1271-1279 Numerical simulation of oxygen transport during the CZ silicon crystal growth process Y.-Y. Teng, J.-C. Chen, W.-T Wun, C.-W. Lu, H.-I Chen, K. Hsieh, C.-Y. Chen, and W.-C. Lan Journal of Crystal Growth 2011 Vol. 318, pp. 318-323( doi:10.1016/j.jcrysgro.2010.11.145). ffects of the furnace pressure on the oxygen and silicon oxide distributions during the growth of multicrystalline silicon ingots by the directional solidification process Y.-Y. Teng, J.-C. Chen, C.-W. Lu, H.-I Chen, C. Hsu and C.-Y. Chen Journal of Crystal Growth 2011 Vol. 318, pp. 224-229.( doi:10.1016/j.jcrysgro.2010.11.110 ) Numerical simulation of heat and fluid Flows for a sapphire single crystal growth by the Kyropoulos method C.-H. Chen, J.-C. Chen, C-W Lu, and C.-M. Liu Journal of Crystal Growth 2011 Vol. 318, pp. 162-167.( doi:10.1016/j.jcrysgro.2010.10.121)

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