師資人員	首頁師資人員專任教師

利定東 教授　Li Ting Tung 辦公室： (Office) E2-204 專線電話： (Tel) x 校內分機： (Campus Extension) x 傳真電話: (Fax) 03-4254501 E-mail： tomili@ncu.edu.tw

論文著作 (Publications)

題目 作者姓名 期刊名稱 出版 年份 期別及 起訖頁數 期別種類 The Dependence of ECR-CVD Processing Parameters on Deposition Uniformity of Hydrogenated Amorphous Silicon (a-Si:H) Films Li Cheng Hu, Yong Shiang Li, Chien Chieh Lee, Jeng Yang Cheng, I Chen Chen, Tomi T. Li* Key Engineering Materials 2015/07 volume 656-657, pp. 92-100 Numerical analysis for the growth of epitaxy layer in a large-size MOCVD reactor Chih-Kai Hu, Hung-I Chien1, and Tomi T. Li* Key Engineering Materials 2015/07 volume 656-657, pp 515-519 Investigation of Electron Cyclotron Resonance Chemical Vapor Deposition Process for a-Si:H Deposition Film Characterization and In Situ Plasma Diagnostics L. C. Hu, C. J. Wang, Y. W. Lin, T. C. Wei, C. C. Lee, J. Y Chang, I. C. Chend, Y. Kawaie and T. T. Li* ECS Journal of Solid State Science and Technology 2015/04 volume 4, issue 7, pp. 213-219 Investigation of surface plasmon enhanced organic light emitting diode by numerical analysis Wan-Jung Yang , Chih-Kai Hu, Tomi T. Li * IEEE Xplore digital library (CSTIC2015), China 2015/03 PP.1-3 Advances n-type nc-Si:H Layers Depositing on Passivation Layer Applied to the Back Surface Field Prepared by RF-PECVD Chia-Cheng Lu, Yu-Lin Hsieh, Pei-Shen Wu, Chien-Chieh Lee Yen-Ho Chub, Jenq-Yang Changb, I-Chen Chend and Tomi T. Li * IEEE Xplore digital library (CSTIC2015), China 2015/03 PP.1-3 Numerical analysis for thermal field of susceptor in MOCVD reactor Kuo-Hung Ho, Chih-Kai Hu, Tomi T. Li *. IEEE Xplore digital library (CSTIC2015), China 2015/03 PP.1-3 Plasma diagnostics of resonance magnetic field effects on a-Si:H thin films deposition using electron cyclotron resonance plasma Hu, L.C, Lin, Y.W, Wang, C.J, Wei, T.C, Yang, C.R, Lee, C.C, Chang, J.Y, Chen, I.C, Tomi T. Li* IEEE Xplore digital library (CSTIC2015), China 2015/03 PP.1-3 Investigation of a-SiOx:H films as passivation layer in heterojunction interface Che-Hung Yeh, Yen-Ho Chu, Chien-Chieh Lee, Yu-Lin Hsieh, Tomi T. Li * IEEE Xplore digital library (CSTIC2015), China 2015/03 PP.1-3 The Optimization of The High Temperature Heat Source for A MOCVD Vacuum Reactor. Hsien-Chih Chiu, Chih-Kai Hu, Hung-I Chien, Tomi T. Li* IEEE Xplore digital library (CSTIC2015, China) 2015/03 PP.1-3 Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature” Journal of Non-Crystalline Solids Yen-Ho Chu , Chien-Chieh Lee, Teng-Hsiang Chang, Yu-Lin Hsieh, Shian-Ming Liu Jenq-Yang Chang, Tomi T. Li*, I-Chen Chen Journal of Non-Crystalline Solids 2015/03 volume 412, pp 5–10

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