師資人員	首頁師資人員專任教師

利定東 教授　Li Ting Tung 辦公室： (Office) E2-204 專線電話： (Tel) x 校內分機： (Campus Extension) x 傳真電話: (Fax) 03-4254501 E-mail： tomili@ncu.edu.tw

論文著作 (Publications)

題目 作者姓名 期刊名稱 出版 年份 期別及 起訖頁數 期別種類 Comparative and integrative study of Langmuir probe and optical emission spectroscopy in a variable magnetic field electron cyclotron resonance chemical vapor deposition process used for depositing hy L.C. Hu, G.M. Ruan, T.C. Wei, C.J. Wang, Y.W. Lin, C.C. Lee, Y. Kawai, Tomi T. Li* Thin Solid Films 2014/11 volume.570 pp.574-579 Low Temperature (180°C) Growth of Smooth Surface Germanium Epilayers on Silicon Substrates Using Electron Cyclotron Resonance Chemical Vapor Deposition Teng-Hsiang Chang, Chiao Chang, Yen-Ho Chu, Chien-Chieh Lee, Jenq-Yang Chang, I.-C. Chen and Tomi T. L* International Journal of Photoenergy 2014/08 volume.2014 Simulation Technology of High Temperature Heating System for Metal-Organic Chemical Vapor Deposition 利定東, 胡智愷, 林義鈞 機械工業雜誌 2014/06 375期，p.89-p.102 CVD Characteristics and mechanism of a-Si:H thin films in electron cyclotron resonance H2-Ar-SiH4 plasma L.C. Hu; C.J. Wang ; Y.W. Lin; T. C. Wei ; C.C. Lee; J.Y Chang; I.C. Chen and Tomi T. Li* ECS Trans. 2014/03 volume.60 pp.1279-1285 Effects of SiOx barrier layers deposited by spray technique for CIGS solar cells on metallic substrates Chien-Wei Tseng, Tomi T. Li*, Wei-Ting Lin, Sheng-Hui Chen, Sung-Cheng Hu, Wan-Hsuan Peng and Yung-Tien Lu ECS Trans. 2014/03 volume.60 pp.1287-1294 Electrical and optical characterization of boron-doped microcrystalline SiH films prepared by ECR-CVD for solar cell Y.L. Hsieh , Tomi T. Li* , L.C. Hu , Y.H. Chu, C.C. Lee , J.Y. Chang , I.C. Chen, J.Y. Lee and S.H Wang ECS Trans. 2014/03 volume.60 pp.557-563 Integrating the quadrupole mass spectrometer, optical emission spectroscopy and Langmuir probe as a plasma characterization tools for ECR-CVD with a-Si:H L.C. Hu; C.J. Wang; Y.W. Lin; T. C. Wei; C.C. Lee; J.Y Chang; I.C. Chen and Tomi T. Li* ECS Trans. 2014/03 volume.60 pp.923-932 Investigation of a-Si:H films as Passivation Layer in Heterojunction Interface at Low Temperature Yen-Ho Chu, Chien-Chieh Lee, Teng-Hsiang Chang, Yu-Lin Hsieh, Shian-Ming Liu, Jenq-Yang Chang, Tomi T. Li*, and I-Chen Chen ECS Trans. 2014/03 volume.60 pp.1245-1250 Kinetic study from thermal crystallization behavior of hydrogenated amorphous silicon prepared by ECRCVD I-Chen Chen , Pei-Yi Lin, Tomi T. Li*, and Jenq-Yang Chang ECS Journal of Solid State Science and Technology 2014/03 volume.3 N75-N82 The Thermal Flow Field Optimization of a Self-Assembly MOCVD Vacuum Reactor Chih-Kai Hu, Chiu-Hsien Chih, Tomi T. Li ECS Trans. 2014/03 volume.660 pp.1101-1106

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