師資人員	首頁師資人員專任教師

利定東 教授　Li Ting Tung 辦公室： (Office) E2-204 專線電話： (Tel) x 校內分機： (Campus Extension) x 傳真電話: (Fax) 03-4254501 E-mail： tomili@ncu.edu.tw

論文著作 (Publications)

題目 作者姓名 期刊名稱 出版 年份 期別及 起訖頁數 期別種類 Machine learning assisted classification of aluminum nitride thin film stress via in-situ optical emission spectroscopy data Yu-Pu Yang1, Te-Yun Lu1, Hsiao-Han Lo1, Wei-Lun Chen1, Peter j. Wang2, Walter Lai2, Yiin-Kuen Fuh1,*, Tomi T. Li1 Materials 2021 14(16) P.4445 SCI Minimizing film residual stress with in-situ OES big data using principle component analysis of deposited AlN films by pulsed DC reactive sputtering Te-Yun Lu1, Yu-Pu Yang1, Hsiao-Han Lo1, Peter j. Wang2, Walter Lai2, Yiin-Kuen Fuh1*,and Tomi T. Li1 The International Journal of Advanced Manufacturing Technology 2021 114(7) P.1975-P.1990. SCI volution of a-Si:H to nc-Si:H transition of hydrogenated silicon films deposited by trichlorosilane using Principle Component Analysis of Optical Emission Spectroscopy Song-Ho Wang, Hsueh-Er Chang, Chien-Chieh Lee, Yiin-Kuen Fuh and Tomi T Li Materials Chemistry and Physics 2020 240 (2020), 122186 SCI Large-scale data principal component analysis of phase transition from a-Si:H to nc-Si:H using optical emission spectra of plasma enhanced chemical vapor deposition (PECVD) Li-Han Kau, Hung-Jui Huang, Hsueh-Er Chang, Yu-Lin Hsieh, Yiin-Kuen Fuh and Tomi T. Li Micro & Nano Letters 2020 15(5) (2020), pp 323-326 SCI Large-scale data analysis of PECVD Amorphous Silicon Interface Passivation layer via the Optical emission spectra for parameterized PCA 3. Hung-Jui Huang, Li-Han Kau, Yu-Lin Hsieh, Chien-Chieh Lee, Yiin-Kuen Fuh and Tomi T. Li International Journal of Advanced Manufacturing Technology 2019 101(1-4) (2019), pp 329–337 SCI Correlation of impedance matching and optical emission spectroscopy during plasma enhanced chemical vapor deposition (PECVD) of nanocrystalline silicon thin films Li-Han Kau, Hung-Jui Huang, Hsueh-Er Chang, Yu-Lin Hsieh, Chien-Chieh Lee, Yiin-Kuen Fuh, and Tomi T. Li Coatings 2019 9(5) (2019) 305 SCI Magnetic field resonance and pressure effects on epitaxial thin film deposition and in situ plasma diagnostics C. R. Yang, C. H. Yeh, L. C. Hu, T. C. Wei, C. C. Lee; J. Y Chang; and Tomi. T. Li1* Plasma Chemistry and Plasma Processing 2018 38(1),pp 247–259. The multi-segment adaptive control of the high temperature heat source in a MOCVD vacuum reactor Jung- Ching Chiu, Chih-Kai Hu, Pi-Cheng Tung and Tomi T. Li* IEEE Xplore, (CSTIC2017) 2017 pp 1-4 Passivation quality and electrical characteristics for boron doped hydrogenated amorphous silicon film Ching-Lin Tseng, Yu-Lin Hsieh, Chien-Chieh Lee, Hsiang-Chih Yu and Tomi T. Li* IEEE Xplore, (CSTIC2017) 2017 pp 1-3 The application of a heating baffle in a high temperature vacuum reactor Kuei-Fang Chen, Jun-Ching Chiu, Chih-Kai Hu, Tomi T. Li* and Pi-Chen Tung, IEEE Xplore, (CSTIC2017) 2017 pp 1-3

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